光学镀膜
Ophir拥有40多年经验，已被公认为先进光学镀膜开发、生产和应用的全球领导者。我公司的高耐磨增透膜（AR），以及多种类型的硬碳膜（HC）拥有最高耐用性、能量传输及最小反射率。
世界领先的专家开发出这种最先进的光学镀膜
- 物理气相沉积（PVD）– 热熔性和电子枪
- 离子辅助沉积（IAD）– 离子枪
- 等离子增强化学气相沉积（PECVD），适用于DLC镀膜
- 小半径表面镀膜
满足每个零部件的镀膜要求：
- 增透膜，反射镜面和滤光片
- 紫外、可见光、近红外、短波红外、中波红外、长波红外
- 多光谱镀膜
- 高效及高耐久性镀膜
- DLC（HC）镀膜和硬碳低反射（LRHC）
- 适用于1.064µ和10.6µ的激光镀膜
- EUV镀膜
- 宽波段镀膜
优异的的镀膜性能保证：
- 宽波段反射膜：反射率<0.5% 至 0.2% / 透过率 >98% 至 99%
- 宽波段增透膜：反射率>98% 至 99%
- 挡风玻璃刮水器测试TS1888 / P 5.4.3 – DLC镀膜
镀膜制造–能力矩阵
| 基材 | 描述 | λ (um) | Avg. R | Avg. T | 镀膜代码 |
|---|---|---|---|---|---|
| Ge | Hard Carbon AR for MWIR | 3-5 | - | 93% | 1010 |
| Ge | High Durability for MWIR | 3.4-5 | 0.5% | 98% | 1187 |
| Ge | High Efficiancy AR for MWIR | 3.4-5 | 0.5% | 98% | 1232 |
| Ge | Low Reflection Hard Carbon AR for MWIR | 3.4-5 | 0.8% | 96% | 1314 |
| Ge | Low Reflection Hard Carbon AR for LWIR | 8-12 | 1.2% | 92% | 1290 |
| Ge | High Efficiancy AR for LWIR | 8-12 | <0.3% | >98% | 1001 |
| Ge | High Durability AR for LWIR | 8-12 | <0.5% | >96% | 1006 |
| Ge | Hard Carbon AR for LWIR | 8-12 | - | >88% | 1007 |
| Si | Hard Carbon AR for SWIR | 1.54 | - | 90% | 1037 |
| Si | Hard Carbon AR for SWIR | 3-5 | - | 93% |
1039 |
| Si | High Durability AR for MWIR |
3.4-5 |
0.5% | 98% | 1178 |
| Si | Low Reflection Hard Carbon AR for MWIR | 3.4-5 | 0.9% | 95% |
1221 |
| Si | High Efficiancy AR for MWIR | 3.4-5 | 0.5% | 98.5% | 1233 |
| Si | High Efficiancy AR for MWIR | 3.4-5 | 0.3% | 98% |
1509 |
| ZnS Cleartran & ZnSe | High Efficinacy AR for SWIR | 0.7-1.7 | 1% | 97.5% | 1501 |
| ZnS Cleartran | High Definition AR for MWIR | 3.4-5 | 1% | 97% | 1171 |
| ZnSe | AR for MWIR | 3.4-5 | 0.5% | 98% | 1193 |
| ZnS Cleartran | Hight Efficancy AR for MWIR | 3.4-5 | 0.3% | 98% | 1020 |
| ZnS Cleartran | High Efficiancy AR for LWIR | 8-12 | 0.5% | 95.5% |
1029 |
| ZnSe | AR for LWIR | 7.7-11.2 | 0.5% | 97% | 1017 |
| ZnSe | High Durability for LWIR | 7.7-11.2 | 0.3% | 98% | 1019 |
| ZnSe | Low Refelction Hard Carbon for LWIR | 8-11.5 | - | 88% | 1190 |
| CaF2 | High Efficiancy AR for SWIR | 0.7-1.7 | 1% | 95.5% | 1502 |
| CaF2 | High Efficiancy AR for MWIR | 3.4-5 | 0.5% | 98% | 1080 |
| IG5 | High Efficiancy AR for LWIR | 8-12 | - | - | 1496 |
| IG6 | High Durability AR for MWIR | 3.4-5 | 0.6% | 98% | 1455 |
| IG6 | Low Reflection Hard Carbon for MWIR | 3-5 | - | - | 1456 |
| IG4 & IG6 | High Efficiancy AR for MWIR | 3-5 | - | - | 1467 |
| IG6 | High Efficiancy AR for MWIr | 3-5 | - | - | 1499 |
| IG4 & IG6 | High Efficiancy AR for LWIR | 8-12 | 0.5% | 96% | 1366 |
| IG6 | Low Reflection Hard Carbon for LWIR | 8-12 | 0.8% | 91% | 1370 |
| IG6 | High Durability for LWIR | 8-12 | 0.6% | 94% | 1405 |
镀膜制造：能力矩阵——双频
| 多频带 | 描述 | λ (um) | Avg. R | Avg. T | 镀膜代码 |
|---|---|---|---|---|---|
| ZnSe | HE AR ON ZnSe FOR MWIR and YAG | 3.6-4.9 um, 1064 nm | 0.5%, 0.5% | 98%, 97.5% | 1021 |
| ZnS Cleartran | HE AR ON ZnS Cleartran FOR MWIR and YAG | 3.6-4.9 um, 1064 nm | 0.5%, 0.5% | 98%, 97.5% | 1034 |
| ZnS Cleartran | HE AR ON ZNS CLEARTRAN FOR MWIR + VIS | 3.5 um 570-750 nm | 0.5%, 0.5% | 96%, 96% |
1033 |
| ZnS Cleartran or ZnSe | HE ON ZnS & ZnSe FOR MWIR+YAG+NIR | 3.6-4.9 um, 1064 nm, 790-830 nm | 0.8%, 0.8%, 0.8% | 98%, 98%, 98% | 1186 |
| ZnS Cleartran | HE for MWIR, YAG and VIS on ZnS | 3.6-4.9 um, 1064 nm 600-750 nm | 1.5%, 0.5%, 2.5% | 96%, 98%, 94% | 1244 |
| ZnS Cleartran | HE MWIR, YAG & SWIR on ZnS | 3.6-4.2 um, 1.57 um, 1064 nm | 0.8%, 0.8%, 0.8% | 97%, 97%, 97% | 1319 |
| ZnS Cleartran or ZnSe | HE AR LWIR, MWIR and YAG | 8-11.5 um, 3.4-5 um, 1064 nm | 1.2%, 3.5% | 93%, 93%, 93% | 1323 |
| ZnS Cleartran or ZnSe | HE AR on for SWIR and YAG | 1.54-1.6 um, 1064 nm | 0.3%, 0.3% | 99%, 99% | 1440 |